Cover ring for a plasma processing apparatus



FIG. 1 is a front, top and right side perspective view of cover ring for a plasma processing apparatus showing our new design;

FIG. 2 is a front elevational view thereof;

FIG. 3 is a right side elevational view thereof;

FIG. 4 is a left side elevational view thereof;

FIG. 5 is a top plan elevational view thereof;

FIG. 6 is a rear elevational view thereof; and,

FIG. 7 is a bottom plan elevational view thereof. 

We claim the ornamental design for cover ring for a plasma processing apparatus, as shown. 